Target Materials
Gallium Oxide Ga2O3 PLD Target
Gallium Oxide Ga2O3 PLD Target
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Material | Gallium Oxide |
Formula | Ga2O3 |
Purity | 99.95% |
Typical Substrates | Al2O3, Si |
Related Materials | In2O3, ZnO, ITO, TiO2 |
Introduction to Ga2O3 Thin Films
Gallium oxide (Ga2O3) is a wide-bandgap semiconductor material that has received significant attention due to its unique electronic and optical properties. In thin film form, Ga2O3 has potential applications in power electronics, sensors, and optoelectronics.
Optical and Electronic Properties of Ga2O3
Ga2O3 exhibits a bandgap of ~4.9 eV, which is higher than that of other wide-bandgap materials such as SiC and GaN. It also has a high electron mobility of up to 200 cm^2/Vs, making it suitable for high-frequency applications. Ga2O3 thin films also exhibit high transparency in the UV region, which makes it useful for UV photodetectors and solar blind photodetectors.
Comparison to Similar Materials
Compared to other similar materials, such as Al2O3 and ZnO, Ga2O3 exhibits higher electron mobility and thermal stability, making it useful for high-temperature electronic devices. It also has a wider bandgap than ZnO, which makes it useful for UV photodetectors. However, Al2O3 has a higher breakdown voltage than Ga2O3, making it more suitable for power electronics applications.
Crystal Structure of Ga2O3
Ga2O3 has a monoclinic crystal structure, with lattice parameters of a=12.215 Å, b=3.047 Å, and c=5.809 Å. The crystal structure is similar to that of β-Ga2O3 and α-Al2O3.
Typical Substrates for Epitaxial Growth
Typical substrates used for the epitaxial growth of Ga2O3 include sapphire, Al2O3, and Si. These substrates have a good lattice match with Ga2O3 and promote high-quality thin film growth.
Other Similar Thin Film Materials
- In2O3
- ZnO
- Al2O3
- TiO2
- SnO2
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