Indium (In) Sputtering Target

Introduction to Indium

Indium is a chemical element with symbol In and atomic number 49. It is a soft, silvery-white metal that is used in various applications such as electronics, alloys, and thin film deposition. Indium is also an important material for pulsed laser deposition (PLD) targets due to its unique properties.

Properties of Indium

Indium has a melting point of 156.6 °C and a boiling point of 2,072 °C. It has a density of 7.31 g/cm³ and a Mohs hardness of 1.2. Indium is a very soft metal and can be easily cut with a knife. It is also a good conductor of electricity and has a low thermal expansion coefficient. Additionally, indium is highly ductile and has a low vapor pressure.

Comparison to Similar Materials

Compared to similar materials like aluminum and copper, indium has a lower melting point and density. It also has a higher thermal conductivity and a lower electrical conductivity. However, indium has a unique property of being able to wet many non-metallic surfaces, which makes it a useful material for certain applications such as soldering.

Crystal Structure of Indium

Indium has a face-centered cubic crystal structure with a lattice parameter of 0.325 nm. Its crystal structure makes it an ideal material for epitaxial growth on certain substrates.

Typical Substrates for Epitaxial Growth of Indium

Some typical substrates for epitaxial growth of indium include gallium arsenide (GaAs), indium phosphide (InP), and zinc selenide (ZnSe). These substrates have a good lattice match with indium, which allows for high-quality thin film growth.

5 Similar Thin Film Materials to Indium

• Tin (Sn)
• Zinc (Zn)
• Gallium (Ga)
• Aluminum (Al)
• Copper (Cu)