Silicon Dioxide (SiO2) PLD Target

Introduction to SiO2 PLD Thin Films

Silicon dioxide (SiO2) is a commonly used dielectric material that has a wide range of applications in thin film form. SiO2 thin films are widely used in microelectronics, sensors, and photovoltaic cells.

Properties of SiO2 Thin Films

SiO2 thin films are known for their high dielectric constant, excellent thermal stability, and low electrical conductivity. They also have a low coefficient of thermal expansion, making them useful in applications that require thermal stability.

Comparison to Other Dielectric Materials

Compared to other dielectric materials, SiO2 has a higher dielectric constant, lower electrical conductivity, and lower thermal expansion coefficient. SiO2 is also more chemically stable and has a higher melting point than many other dielectric materials.

Crystal Structure of SiO2

SiO2 has a crystalline structure that is based on a tetrahedral arrangement of silicon and oxygen atoms. 

List of 5 Similar Thin Film Materials to SiO2 Thin Films

1. Aluminum oxide (Al2O3)
2. Titanium dioxide (TiO2)
3. Zirconium dioxide (ZrO2)
4. Hafnium dioxide (HfO2)
5. Niobium pentoxide (Nb2O5)