Tin Oxide SnO2 PLD Target
Tin Oxide SnO2 PLD Target
Material | Tin Oxide, stannic oxide |
Formula | SnO2 |
Purity | 99.99% |
Typical Substrates | Al2O3 sapphire, rutile TiO2, silicon dioxide (SiO2). |
Related Materials | ITO, TiO2, Al2O3, In2O3 |
Introduction to the properties of SnO2 thin films for optoelectronics
SnO2, also known as tin dioxide, is a wide-gap semiconductor with interesting optoelectronic properties. It has been used as a material for various thin film applications in fields such as solar cells, gas sensors, and transparent conductive films.
Optical and Electronic Properties of SnO2
SnO2 has a high transparency in the visible light range and a high electron mobility. These properties make it a promising material for use in optoelectronics applications, such as transparent electrodes in solar cells or touch screens.
Optoelectric Properties of SnO2 Compared to In2O3
SnO2 has comparable optoelectric properties to another well-known material, Indium Tin Oxide (In2O3). Both materials have high transparency and electron mobility, making them useful in optoelectronics. However, SnO2 has the advantage of being more abundant and less expensive than In2O3, making it a potentially more attractive material for commercial applications.
Crystal Structure of SnO2
SnO2 has a tetragonal crystal structure with tetragonal rutile structure.
Typical Substrates for Epitaxial Growth of SnO2
Good lattice matching between the substrate and SnO2 is important for high-quality epitaxial growth of SnO2 thin films. Some typical substrates used for SnO2 growth include sapphire, rutile TiO2, and silicon dioxide (SiO2).
Other Similar Thin Film Materials
Other materials used for optoelectronics applications include:
- Indium Tin Oxide (In2O3)
- Zinc Oxide (ZnO)
- Titanium Dioxide (TiO2)
- Gallium Oxide (Ga2O3)
- Aluminum Oxide (Al2O3)
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